Vessel and system for treating wafers with fluids

Details Vessel and system for treating wafers with fluids Vessel and system for treating wafers with fluids

1985-06-24

1988-04-19

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With work assembling or disassembling means

134 95, 134102, 134114, 134201, B08B 304

Patent

active

047382724

ABSTRACT:
Disclosed is apparatus for treating semiconductor wafers with fluids. The device comprises one or more vessels having lateral walls defining open ends. The vessels are arranged serially, and the open ends are engaged with a treatment fluid inlet and a treatment fluid outlet. Wafers or a wafer carrier are introduced into the vessels for treatment. The vessels are constructed of material that is inert to the treatment fluids and designed to minimize creation of eddy currents and fluid traps. Hydraulically full fluid flow through the vessel uniformly contacts the wafers with the fluid and results in improved and more reproducible prediffusion cleaning, rinsing, etc.

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