Vessel and system for treating wafers with fluids

Details Vessel and system for treating wafers with fluids Vessel and system for treating wafers with fluids

1984-05-21

1986-03-25

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With work assembling or disassembling means

118500, 134 95, 134102, 134114, 134201, 206454, 206509, 220 4C, B08B 304

Patent

active

045776504

ABSTRACT:
Disclosed is apparatus for treating semiconductor wafers with fluids. The device comprises a plurality of vessel segments having lateral walls for enclosing the wafers defining open ends. Sealing structure is provided at the ends so that the segments may be serially nested together and engaged with a fluid inlet and a fluid outlet in a wafer treatment fluid flow line. The vessel segments are constructed of material that is inert to the treatment fluids and designed to minimize creation of eddy currents and fluid traps. Fluid flowing through the vessel uniformly contacts the wafers and results in improved and more reproducible pre-diffusion cleaning, rinsing, etc.

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