Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-03-19
1981-11-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430152, 430176, 430192, 430197, 430271, 430280, 430290, G03C 160, G03C 176
Patent
active
043025242
ABSTRACT:
A light-sensitive vesicular imaging composition comprising a vesiculating agent which liberates gas upon exposure to activating radiation and a matrix which is a novolac branched epoxy resin of a bis-glycidyl ether and a dihydric phenol.
REFERENCES:
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patent: 3615491 (1971-10-01), Weyde
patent: 3622333 (1971-11-01), Cope
patent: 3708296 (1973-01-01), Schlesinger
patent: 3817845 (1974-06-01), Feinberg
patent: 3960684 (1976-06-01), Feinberg
patent: 4032518 (1977-06-01), Kotlarchik et al.
Kuszewski James R.
Mandella William L.
Bowers Jr. Charles L.
GAF Corporation
Magee Jr. James
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