Vesicular film elements

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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Details

430152, 430176, 430192, 430197, 430271, 430280, 430290, G03C 160, G03C 176

Patent

active

043025242

ABSTRACT:
A light-sensitive vesicular imaging composition comprising a vesiculating agent which liberates gas upon exposure to activating radiation and a matrix which is a novolac branched epoxy resin of a bis-glycidyl ether and a dihydric phenol.

REFERENCES:
patent: 3552965 (1971-01-01), Notley et al.
patent: 3615491 (1971-10-01), Weyde
patent: 3622333 (1971-11-01), Cope
patent: 3708296 (1973-01-01), Schlesinger
patent: 3817845 (1974-06-01), Feinberg
patent: 3960684 (1976-06-01), Feinberg
patent: 4032518 (1977-06-01), Kotlarchik et al.

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