Very large area/volume microwave ECR plasma and ion source

Details Very large area/volume microwave ECR plasma and ion source Very large area/volume microwave ECR plasma and ion source

2005-12-16

2009-02-24

Vu, David Hung (Department: 2821)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230MA, C156S345410, C156S345420

Reexamination Certificate

active

07493869

ABSTRACT:
The present invention is an apparatus and method for producing very large area and large volume plasmas. The invention utilizes electron cylcotron resonances in conjunction with permanent magnets to produce dense, uniform plasmas for long life ion thruster applications or for plasma processing applications such as etching, deposition, ion milling and ion implantation. The large area source is at least five times larger than the 12-inch wafers being processed to date. Its rectangular shape makes it easier to accommodate to materials processing than sources that are circular in shape. The source itself represents the largest ECR ion source built to date. It is electrodeless and does not utilize electromagnets to generate the ECR magnetic circuit, nor does it make use of windows.

REFERENCES:
patent: 5203960 (1993-04-01), Dandl
patent: 5324362 (1994-06-01), Schneider et al.
patent: 5370765 (1994-12-01), Dandl
patent: 5707452 (1998-01-01), Dandl
patent: 6153977 (2000-11-01), Taira et al.
patent: 6322662 (2001-11-01), Ishii et al.
patent: 6376028 (2002-04-01), Laurent et al.
patent: 6830652 (2004-12-01), Ohmi et al.
patent: 7404991 (2008-07-01), Ohmi et al.
patent: 2002/0121344 (2002-09-01), Noguchi
patent: 2003/0173030 (2003-09-01), Ishii et al.
patent: 2003/0183170 (2003-10-01), Kato et al.
patent: 2004/0045674 (2004-03-01), Ishii et al.
patent: 06151092 (1994-05-01), None
patent: 06158298 (1994-06-01), None
patent: WO 91/12353 (1991-08-01), None

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