Very high-aperture projection objective

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S649000

Reexamination Certificate

active

07495840

ABSTRACT:
A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA≧0.85, if appropriate of NA≧1.

REFERENCES:
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5691802 (1997-11-01), Takahashi
patent: 5742436 (1998-04-01), Fürter
patent: 5986824 (1999-11-01), Mercado
patent: 6008884 (1999-12-01), Yamaguchi et al.
patent: 6097537 (2000-08-01), Takahashi et al.
patent: 6169627 (2001-01-01), Schuster
patent: 6191429 (2001-02-01), Suwa
patent: 6349005 (2002-02-01), Schuster et al.
patent: 6486940 (2002-11-01), Williamson
patent: 6631036 (2003-10-01), Schuster
patent: 6700645 (2004-03-01), Shigematsu
patent: 6995930 (2006-02-01), Shafer et al.
patent: 2002/0001141 (2002-01-01), Shafer et al.
patent: 2002/0005938 (2002-01-01), Omura
patent: 2002/0024741 (2002-02-01), Terasawa et al.
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174301 (2003-09-01), Imanishi
patent: 2004/0062491 (2004-04-01), Sato et al.
patent: 2006/0007532 (2006-01-01), Shafer
patent: 0 023 231 (1981-02-01), None
patent: 0 605 103 (1994-07-01), None
patent: 1 061 396 (2000-12-01), None
patent: 1 094 350 (2001-04-01), None
patent: 1 139 138 (2001-10-01), None
patent: 11006957 (1999-01-01), None
patent: 2000171707 (2000-09-01), None
patent: 2000352666 (2000-12-01), None
patent: 2001-23887 (2001-01-01), None
patent: 2001228401 (2001-08-01), None
patent: 2001343582 (2001-12-01), None
patent: 2002 244035 (2002-08-01), None
patent: 2002277742 (2002-09-01), None
patent: 2002323653 (2002-11-01), None
patent: 2003185920 (2003-07-01), None
patent: 0123935 (2001-04-01), None
patent: WO 01 51979 (2001-07-01), None
patent: WO 01 65296 (2001-09-01), None
patent: WO 02 091078 (2002-11-01), None
patent: WO 03 077037 (2003-09-01), None
M. Switkes and M. Rothchild, Immersion lithography at 157 nm, J. Vac. Sci. Technol. B, Nov./Dec. 2001, pp. 2353-2356, vol. 19, No. 6.
Hiroaki Kawata et al., Fabrication of 0.2 μm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens, Japanese Journal of Applied Physics, Dec. 31, 1992, pp. 4174-4177, vol. 31, No. 12B, Part 1.
Hiroaki Kawata et al., Optical projection lithography using lenses with numerical apertures greater than unity, Microelectronic Engineering, May 9, 1989, pp. 31-36, vol. 9, Nos. 1-4, Elsevier Publishers BV., Amsterdam, NL.
Willi Ulrich et al., Trends in Optical Design of Projection Lenses for UV- and EUV-Lithography, Proceedings of SPIE, Aug. 3, 2000, pp. 13-24, vol. 4146,SPIE, Bellingham, VA., US.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Very high-aperture projection objective does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Very high-aperture projection objective, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Very high-aperture projection objective will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4088395

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.