Vertically-stacked process reactor and cluster tool system for a

Details Vertically-stacked process reactor and cluster tool system for a Vertically-stacked process reactor and cluster tool system for a

1997-08-29

1999-03-09

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

118725, 118729, C23C 1600

Patent

active

058794590

ABSTRACT:
A low profile, compact atomic layer deposition reactor (LP-CAR) has a low-profile body with a substrate processing region adapted to serve a single substrate or a planar array of substrates, and a valved load and unload port for substrate loading and unloading to and from the LP-CAR. The body has an inlet adapted for injecting a gas or vapor at the first end, and an exhaust exit adapted for evacuating gas and vapor at the second end. The LP-CAR has an external height no greater than any horizontal dimension, and more preferably no more than two-thirds any horizontal dimension, facilitating a unique system architecture. An internal processing region is distinguished by having a vertical extent no greater than one fourth the horizontal extent, facilitating fast gas switching. In some embodiments one substrate at a time is processed, and in other embodiments there may be multiple substrates arranged in the processing region in a planar array. The compact reactor is distinguished by individual injectors, each of which comprise a charge tube formed between a charge valve and an injection valve. The charge valve connects the charge tube to a pressure regulated supply, and the injection valve opens the charge tube into the compact reactor. Rapidly cycling the valves injects fixed mass-charges of gas or vapor into the compact reactor. Multiple such compact reactors are stacked vertically, interfaced into a vacuum handling region having a Z-axis robot and a load/unload opening.

REFERENCES:
patent: 4533410 (1985-08-01), Ogura et al.
patent: 4533820 (1985-08-01), Shimizu
patent: 4689247 (1987-08-01), Doty et al.
patent: 4828224 (1989-05-01), Crabb et al.
patent: 4836138 (1989-06-01), Robinson et al.
patent: 4846102 (1989-07-01), Ozias
patent: 4976996 (1990-12-01), Monkowski et al.
patent: 4993360 (1991-02-01), Nakamura
patent: 5077875 (1992-01-01), Hoke et al.
patent: 5119760 (1992-06-01), McMillan et al.
patent: 5194401 (1993-03-01), Adams et al.
patent: 5336327 (1994-08-01), Lee
patent: 5749974 (1998-05-01), Hakuba et al.
patent: 5788447 (1998-08-01), Yonemitsu et al.

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