Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Patent
1999-05-21
2000-07-04
Markoff, Alexander
Cleaning and liquid contact with solids
Processes
Using solid work treating agents
134 2, 134 34, 134902, 15 971, 15102, B08B 700, B08B 300
Patent
active
060823771
ABSTRACT:
A wafer cleaning and drying apparatus comprises a vertical wafer drive assembly providing two-sided wafer cleaning by symmetrically disposed brushes. Each wafer brush comprises two parallel rotatable shafts within the lumen of a substantially tubular sponge, with an adjustable distance between the two shafts, which is narrowed to facilitate insertion into the sponge and widened to stretch the sponge into a substantially oval cross-sectional shape, thereby improving traction. One or more nonrotating perforated fluid delivery tubes are mounted within the lumen of the sponge in the space between the two shafts. The apparatus further comprises a minimal volume rinse/dry enclosure that conserves water and process chemicals; and a wafer transport assembly configured to transfer multiple wafers simultaneously between multiple process stations.
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Markoff Alexander
Steuber David E.
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