Coating apparatus – Gas or vapor deposition – Work support
Patent
1997-05-14
1999-01-12
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
Work support
118500, 117200, 206710, 206832, 211 4118, 414935, 414938, C23C 1600
Patent
active
058581030
ABSTRACT:
A radius of 0.1-1 mm is provided at a corner between a bottom of each of semiconductor wafer inserting and supporting grooves and a base of a supporting piece between the supporting groove and a supporting groove adjacent thereto, which are formed in bars connecting upper and lower end plates of a vertical wafer boat.
REFERENCES:
patent: 4872554 (1989-10-01), Quernemoen
patent: 5482559 (1996-01-01), Imai
patent: 5492229 (1996-02-01), Tanaka
patent: 5534074 (1996-07-01), Koons
patent: 5638958 (1997-06-01), Sanchez
Patent Abstracts of Japan, vol. 095, No. 003, Apr. 28, 1995, JP-A-06 349758, Dec. 22, 1994.
Patent Abstracts of Japan, vol. 095, No. 001, Feb. 28, 1995, JP-A-06 302680, Oct. 28, 1994.
Patent Abstracts of Japan, vol. 017, No. 130 (M-1382), Mar. 18, 1993, JP-A-04 310373, Nov. 2, 1992.
Patent Abstracts of Japan, vol. 095, No. 009, Oct. 31, 1995, JP-A-07 147258, Jun. 6, 1995.
Patent Abstracts of Japan, vol. 013, No. 026(E-706), Jan. 20, 1989, JP-A-63 228611, Sep. 22, 1988.
Patent Abstracts of Japan, vol. 014, No. 312 (E-0948), Jul. 5, 1990, JP-A-02 102524, Apr. 16, 1990.
Patent Abstracts of Japan, vol. 016, No. 375 (C-0973), Aug. 12, 1992, JP-A-04 120000, Apr. 21, 1992.
Patent Abstracts of Japan, vol. 018, No. 477 (E-1602), Sep. 6, 1994, JP-A-06 163439, Jun. 10, 1994.
Nakajima Toshio
Yamamoto Hisao
Asahi Glass Company Ltd.
Kunemund Robert
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