Vertical wafer boat

Coating apparatus – Gas or vapor deposition – Work support

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Details

118500, 117200, 206710, 206832, 211 4118, 414935, 414938, C23C 1600

Patent

active

058581030

ABSTRACT:
A radius of 0.1-1 mm is provided at a corner between a bottom of each of semiconductor wafer inserting and supporting grooves and a base of a supporting piece between the supporting groove and a supporting groove adjacent thereto, which are formed in bars connecting upper and lower end plates of a vertical wafer boat.

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