Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1997-01-08
1999-08-17
Bueker, Richards
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
C23C 1644, B01D 122
Patent
active
059388536
ABSTRACT:
A vaporizer for halide-free, silicon-containing liquid reactants used in producing preforms is provided. The vaporizer includes a heated, vertically-oriented expansion chamber (20) and a vertical hollow shaft (42) which extends into the chamber and has a plurality of orifices (45) at its upper end (44). Preheated reactant is supplied to the vertical shaft (42) at an elevated pressure and is sprayed onto the chamber's heated wall (22) by the orifices (45). A portion of the liquid reactant vaporizes upon entering the internal volume (24) of the chamber (20) due to the pressure drop between the inside of the shaft and the inside of the chamber. The remainder of the liquid reactant vaporizes by being heated through contact with the chamber's wall (22). Higher molecular weight species present in the raw material or generated by the vaporization process are collected in the bottom portion of the chamber where they can be periodically removed.
REFERENCES:
patent: 3438803 (1969-04-01), Dubble et al.
patent: 4158092 (1979-06-01), Botsch et al.
patent: 5204314 (1993-04-01), Kirlin
Bueker Richards
Corning Incorporated
Murphy Edward F.
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