Vertical type processing apparatus

Details Vertical type processing apparatus Vertical type processing apparatus

1992-02-13

1993-06-08

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 118723, 118724, H01L 2100

Patent

active

052175600

ABSTRACT:
An ashing apparatus of the vertical type comprises a reaction tube erected in the vertical direction to house therein a plurality of semiconductor wafers, an inner tube arranged in the reaction tube to enclose the semiconductor wafers and having a plurality of holes through which activated radicals in plasma can be selectively passed, a reaction gas supply pipe for supplying reaction gases into a space between the reaction tube and the inner tube, and plasma generating electrode unit located outside the reactor tube to generate plasma of the reaction gases only in the space between the reaction tube and the inner tube.

REFERENCES:
patent: 4341616 (1982-07-01), Nagatomoto et al.
patent: 5015330 (1991-05-01), Okumura et al.

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