1976-06-08
1981-10-27
Larkins, William D.
357 20, 357 36, 357 51, H01L 2980
Patent
active
042977185
ABSTRACT:
Vertical type field effect transistors are disclosed including one of the highly doped source, gate and drain regions disposed on one of the main opposite faces of one of the semiconductor substrate and the remaining region or regions disposed on the other mainface of the substrate. At least one of the regions is divided into a plurality of elongated slender portions and metallic electrodes are disposed in ohmic contact with the respective regions so as to be identical in configuration to the latter. The highly doped regions themselves may form electrodes.
REFERENCES:
patent: 3011104 (1961-11-01), Watanabe et al.
patent: 3436689 (1969-04-01), Fluhr
patent: 3564442 (1971-02-01), Germann
patent: 3663873 (1972-05-01), Yagi
patent: 3814995 (1974-06-01), Teszner
patent: 3905036 (1975-09-01), Goronkin
Kitsuregawa Takashi
Nishizawa Jun-ichi
Adams Bruce L.
Burns Robert E.
Larkins William D.
Lobato Emmanuel J.
Semiconductor Research Foundation Mitsubishi Denki K.K.
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