Vertical trench inductor

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

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257622, H01L 2702, H01L 2906

Patent

active

053369211

ABSTRACT:
A method of forming vertical trench inductor (10) includes providing a layer (11) and forming a plurality of trenches (12) vertically therein. The trenches (12) are filled with a conductive material (16) and etched using a photolithographically defined mask (17). The etching produces a conductive liner (18) covering two sidewalls (13) and a bottom surface (14) of the trench (12). A second conductive layer is formed and patterned to couple the conductive liner (18) covering a sidewall (13) of a first trench (12) to the conductive liner (18) of an opposite sidewall (13) of an adjacent trench (12) to form an inductive coil.

REFERENCES:
patent: 3614554 (1971-10-01), Shield et al.
patent: 3988764 (1976-10-01), Cline et al.
patent: 5095357 (1992-03-01), Andoh et al.

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