Vertical thermal processor for semiconductor wafers

Details Vertical thermal processor for semiconductor wafers Vertical thermal processor for semiconductor wafers

1990-01-22

1991-03-19

Bennet, Henry A.

Heating

Work feeding, agitating, discharging or conveying...

Removable furnace bottom section or kiln cart

432 6, 432 56, 432205, 432239, 432242, F27D 312

Patent

active

050006827

ABSTRACT:
Semiconductor wafers within a supporting vertical wafer tower are positioned within a vertical process chamber through a lower gate valve fixed to a supporting framework. The gate valve is sealed to a similar gate valve at the upper end of a movable load lock on the framework, within which the wafers are subjected to pre-treatment and post-treatment processes. Two load locks are alternately used in conjunction with the process chamber and a wafer loading station on the framework. In addition, a cleaning element is movably mounted on the framework for periodically maintaining the interior surfaces of the process tube within the process chamber.

REFERENCES:
patent: 4610628 (1986-09-01), Mizushina
patent: 4738618 (1988-04-01), Massey et al.
patent: 4758157 (1988-07-01), Hailey
patent: 4790750 (1988-12-01), Bourel et al.
patent: 4883020 (1989-11-01), Kasai et al.
patent: 4923584 (1990-05-01), Bramhall, Jr. et al.

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