Vertical thermal processor

Details Vertical thermal processor Vertical thermal processor

1987-05-14

1988-04-19

Tapolcai, William E.

Heating

Work feeding, agitating, discharging or conveying...

Removable furnace bottom section or kiln cart

432207, 432208, F27D 312

Patent

active

047386185

ABSTRACT:
Vertically oriented thermal processor, also known as a vertical diffusion furnace for the processing of silicon or gallium arsenide wafers or substrates including a vertically positionable furnace assembly, and a quartz bell-jar shaped element which positions coaxially over and about another quartz bell jar like vertically positionable process tube forming a dual wall contamination barrier. The furnace and the process tube bell jar can be moved up and down pneumatically as a unit or independently of one another during processing modes. Pneumatic cylinders provide for the lifting of the furnace element away from the wafers to ramp temperatures downwardly at an accelerated rate. An overhead track positions for accelerated removal of the furnace and process tube to the exterior of the cabinet without disconnection of electrical, pneumatic or gas connections for maintenance or component changeout. A microprocessor controls and monitors all functions of the vertical thermal processor, and includes a rear microprocessor control as well as a front panel control. Silicon wafer loads can be loaded from the front, side or back by manual, softlander or robotic means.

REFERENCES:
patent: 2432239 (1947-12-01), Hoak
patent: 2635866 (1953-04-01), Olson
patent: 3166305 (1965-01-01), Troglione et al.
patent: 3463470 (1969-08-01), Green et al.
patent: 4459104 (1984-07-01), Wollmann
patent: 4490111 (1984-12-01), Yakura
patent: 4610628 (1986-09-01), Migushina

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