Vertical semiconductor processor

Details Vertical semiconductor processor Vertical semiconductor processor

1986-03-10

1987-05-12

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 47, 427 74, 427 86, B05D 306

Patent

active

046649395

ABSTRACT:
A vertical processor for the continuous deposition of semiconductor alloy material by glow discharge techniques. The vertical processor includes a plurality of operatively interconnected deposition chambers, at least one chamber of which includes a generally vertical cathode plate about each of the opposed faces of which a plasma region is developed and a substrate continuously passes for the deposition of semiconductor alloy material thereonto. Through the utilization of the vertical deposition scenario, the length of the processor may be substantially foreshortened, power consumption may be substantially decreased and feedstock gases may be more efficiently utilized.

REFERENCES:
patent: 4515107 (1985-05-01), Fournier et al.
patent: 4557944 (1985-12-01), Arai

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