Vertical polishing device and method

Abrading – Abrading process – Glass or stone abrading

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Details

451285, 451287, B24B 100

Patent

active

059280620

ABSTRACT:
The present invention relates to a chemical mechanical polishing (CMP) machine and method in which at least one polishing device is provided with a vertically-oriented polishing surface and a slurry delivery mechanism. As a result, the footprint of the machine is greatly reduced and the prevention of contaminants embedding in the polishing device can be promoted.

REFERENCES:
patent: 2933437 (1960-05-01), Loosme
patent: 3748677 (1973-07-01), Frank et al.
patent: 4208760 (1980-06-01), Dexter et al.
patent: 4393628 (1983-07-01), Ottman et al.
patent: 4481741 (1984-11-01), Bouladon et al.
patent: 4586296 (1986-05-01), Saunders
patent: 4934102 (1990-06-01), Leach et al.
patent: 5012618 (1991-05-01), Price et al.
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5152104 (1992-10-01), Wood et al.
patent: 5317778 (1994-06-01), Kudo et al.
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5468302 (1995-11-01), Thietje
patent: 5482497 (1996-01-01), Gonnella et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5498196 (1996-03-01), Karlsrud et al.
patent: 5520573 (1996-05-01), Sumita et al.
patent: 5643067 (1997-07-01), Katsuoka et al.
patent: 5664987 (1997-09-01), Renteln
patent: 5665201 (1997-09-01), Sahota
patent: 5702292 (1997-12-01), Brunelli et al.
patent: 5720652 (1998-02-01), Steinwender et al.

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