Vertical photoresist developer

Details Vertical photoresist developer Vertical photoresist developer

1985-12-20

1988-03-22

Hornsby, Harvey C.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134131, 134199, B08B 302

Patent

active

047321733

ABSTRACT:
Vertical photoresist developer for processing of any size of printed circuit boards carried on a processing cassette. The processing cassette is carried by a chain through a main chamber, a rinse chamber and a drying chamber, all the processing chambers in line with each other. The processing system is electromechanical and electrically controlled, as well as air and liquid flow control. The developer is system oriented and symmetrical in operation to either side of the board.

REFERENCES:
patent: 2671241 (1954-03-01), Starner
patent: 3076730 (1963-02-01), Nolte
patent: 3593640 (1971-07-01), Gall
patent: 3694847 (1972-10-01), Hetman et al.
patent: 3849831 (1974-11-01), De Verter
patent: 4208760 (1980-06-01), Dexter
patent: 4281675 (1981-08-01), Pure
patent: 4351266 (1982-09-01), Ando et al.
patent: 4452264 (1984-06-01), Kreisel et al.
patent: 4506687 (1985-03-01), Rosch, III
patent: 4539069 (1985-09-01), Fishman et al.
patent: 4561904 (1985-12-01), Eberhardt

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