Vertical LPCVD furnace with reversible manifold collar and metho

Details Vertical LPCVD furnace with reversible manifold collar and metho Vertical LPCVD furnace with reversible manifold collar and metho

1997-12-15

1998-09-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118725, 428 341, 428 344, 294011, C23C 1600

Patent

active

058006168

ABSTRACT:
A reversible manifold collar design for use in a vertical low pressure chemical vapor deposition (LPCVD) furnace incorporates first and second notches in opposing ends thereof such that one of the notches aligns with an exhaust port in the deposition chamber of the furnace irrespective of the installed orientation of the collar. As such, blockage of the exhaust port, which might otherwise increase deposition rates and/or decrease film uniformity, may be avoided. Also, a method of retrofitting a LPCVD furnace includes removing an existing manifold collar and replacing it with a reversible manifold collar such that one of a pair of notches therein is adapted to align with an exhaust port irrespective of the orientation of the collar.

REFERENCES:
patent: 5458685 (1995-10-01), Hasebe
patent: 5458688 (1995-10-01), Watanabe
patent: 5478609 (1995-12-01), Okamura
patent: 5482559 (1996-01-01), Imai

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