Vertical load-lock reduced-pressure type chemical vapor depositi

Details Vertical load-lock reduced-pressure type chemical vapor depositi Vertical load-lock reduced-pressure type chemical vapor depositi

1989-03-03

1991-10-22

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

118719, 414217, 414331, C23C 1600

Patent

active

050585266

ABSTRACT:
A CVD apparatus having a single loading-unloading chamber that serves as a loading chamber in the left and center parts and as an unloading chamber in the right and center parts. Alternately, wafers provisionally stored in cassettes are put into and taken from an auxiliary chamber connected at the center part. The loading-unloading chamber has a sliding bed for slidingly transferring two cassettes, each used for temporarily carrying a plurality of wafers for loading from a load cassette table through the loading cassette to a reaction chamber and for unloading from the reaction chamber through an unloading cassette to an unloading cassette table.

REFERENCES:
patent: 4542712 (1985-09-01), Sato et al.
patent: 4640223 (1987-02-01), Dozier
patent: 4666734 (1987-05-01), Kamiya et al.
patent: 4770590 (1988-09-01), Hugues et al.

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