Coating apparatus – Gas or vapor deposition – With treating means
Patent
1991-02-22
1992-07-07
Simmons, David A.
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118730, 118733, 219390, 219405, 219411, H01L 2100
Patent
active
051273659
ABSTRACT:
A heat-treatment apparatus includes a quartz heat-treatment tube having a vertically set axis in which a heat-treatment gas is supplied from its lower portion, and a quartz cap to be mounted on an upper opening portion of the heat-treatment tube. An opening is formed in a central portion of the cap, a quartz rod is inserted through the opening along the axis of the heat-treatment tube, and semiconductor parts to be heat-treated are held by the rod. A first exhaust duct is formed in a side surface of the heat-treatment tube at a position higher than at least the semiconductor parts held by the rod and exhausts the heat-treatment gas in the heat-treatment tube. A ring-like chamber open toward the inner surface of the cap is formed in the outer circumferential surface of the heat-treatment tube in a position close to the upper opening surface, and a second exhaust duct communicates with this chamber. The chamber communicates with the opening portion formed in the cap in the outer circumferential portion of the rod and communicates with the interior of the heat-treatment tube, thereby exhausting an external air drawn from the opening together with the heat-treatment gas in the heat-treatment tube.
REFERENCES:
patent: 4501766 (1985-02-01), Suzuki et al.
patent: 4950870 (1990-08-01), Mitsuhashi et al.
patent: 4989540 (1991-02-01), Fuse et al.
Koyama Mitsutoshi
Sonobe Hironori
Takahashi Koichi
Goudreau George A.
Kabushiki Kaisha Toshiba
Simmons David A.
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