Vertical heat-treatment apparatus for semiconductor parts

Details Vertical heat-treatment apparatus for semiconductor parts Vertical heat-treatment apparatus for semiconductor parts

1991-02-22

1992-07-07

Simmons, David A.

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118730, 118733, 219390, 219405, 219411, H01L 2100

Patent

active

051273659

ABSTRACT:
A heat-treatment apparatus includes a quartz heat-treatment tube having a vertically set axis in which a heat-treatment gas is supplied from its lower portion, and a quartz cap to be mounted on an upper opening portion of the heat-treatment tube. An opening is formed in a central portion of the cap, a quartz rod is inserted through the opening along the axis of the heat-treatment tube, and semiconductor parts to be heat-treated are held by the rod. A first exhaust duct is formed in a side surface of the heat-treatment tube at a position higher than at least the semiconductor parts held by the rod and exhausts the heat-treatment gas in the heat-treatment tube. A ring-like chamber open toward the inner surface of the cap is formed in the outer circumferential surface of the heat-treatment tube in a position close to the upper opening surface, and a second exhaust duct communicates with this chamber. The chamber communicates with the opening portion formed in the cap in the outer circumferential portion of the rod and communicates with the interior of the heat-treatment tube, thereby exhausting an external air drawn from the opening together with the heat-treatment gas in the heat-treatment tube.

REFERENCES:
patent: 4501766 (1985-02-01), Suzuki et al.
patent: 4950870 (1990-08-01), Mitsuhashi et al.
patent: 4989540 (1991-02-01), Fuse et al.

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