Vertical heat-treating apparatus

Details Vertical heat-treating apparatus Vertical heat-treating apparatus

1991-06-28

1993-01-12

Hearn, Brian E.

Metal working

Barrier layer or semiconductor device making

Barrier layer device making

414152, 414172, 414404, H01L 2169

Patent

active

051786397

ABSTRACT:
A vertical heat-treating apparatus which is effective for preventing dust or fine particles from being attached to a wafer during the loading/unloading or transport of the wafer thereby to manufacture a high-quality wafers. This apparatus comprises a carrier stocker storing a plurality of wafer carriers, a loading/unloading mechanism for transferring the wafers between the wafer carriers and a heat-treating vessel, a plurality of heat-treating furnaces for heat-treating the wafers, a transport mechanism for transporting the heat-treating vessel to and from the vertical heat-treating furnace, and gas supply means for forming a clear gas stream passing exclusively through the loading/unloading mechanism and/or the transport mechanism.

REFERENCES:
patent: 4938691 (1990-07-01), Ohkase et al.
patent: 4947784 (1990-08-01), Nishi
patent: 4955775 (1990-09-01), Ohkase et al.
patent: 5028195 (1991-07-01), Ishii et al.
patent: 5030057 (1991-07-01), Nishi et al.
patent: 5048164 (1991-09-01), Harima

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