Vertical furnace for heat-treating semiconductor

Heating – Work feeding – agitating – discharging or conveying... – Removable furnace bottom section or kiln cart

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

432124, 432253, 432 6, F27D 500, F27B 900

Patent

active

046106286

ABSTRACT:
A vertical furnace for heat-treating a semiconductor is disclosed which is capable of effectively and safely accomplishing the heat-treating of a semiconductor. The vertical furnace includes a furnace section which is open at the lower end thereof to allow a boat for supporting a semiconductor thereon to be introduced and removed through the lower open end with respect to the furnace section. Also, a vertical furnace is disclosed which is adapted to effectively prevent a semiconductor from being polluted by dust in an operation space.

REFERENCES:
patent: 1838015 (1931-12-01), Von Forester et al.
patent: 2344035 (1944-03-01), Etten
patent: 2454253 (1948-11-01), Kniveton
patent: 2940745 (1960-06-01), Grieger et al.
patent: 3463470 (1969-08-01), Green et al.
patent: 3836325 (1974-09-01), Nakamura et al.
patent: 3867093 (1975-02-01), Huttermann
patent: 4439146 (1984-03-01), Sugita

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vertical furnace for heat-treating semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vertical furnace for heat-treating semiconductor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vertical furnace for heat-treating semiconductor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1013602

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.