Vertical cavity surface emitting laser including indium and...

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S045010

Reexamination Certificate

active

07408964

ABSTRACT:
Quantum wells and associated barriers layers can be grown to include nitrogen (N), aluminum (Al), antimony (Sb), phosphorous (P) and/or indium (In) placed within or about a typical GaAs substrate to achieve long wavelength VCSEL performance, e.g., within the 1260 to 1650 nm range. In accordance with features of the present invention, a vertical cavity surface emitting laser (VCSEL) can include at least one quantum well comprised of InGaAsN; barrier layers sandwiching said at least one quantum well; and confinement layers sandwiching said barrier layers. Confinement and barrier layers can comprise AlGaAs, GaAsN. Barrier layers can also comprise InGaAsN. Quantum wells can also include Sb. Quantum wells can be developed up to and including 50 Å in thickness. Quantum wells can also be developed with a depth of at least 40 meV.

REFERENCES:
patent: 4445218 (1984-04-01), Coldren
patent: 4608697 (1986-08-01), Coldren
patent: 4622672 (1986-11-01), Coldren et al.
patent: 4829347 (1989-05-01), Cheng et al.
patent: 4873696 (1989-10-01), Coldren et al.
patent: 4896325 (1990-01-01), Coldren
patent: 5045499 (1991-09-01), Nishizawa et al.
patent: 5082799 (1992-01-01), Holmstrom et al.
patent: 5245622 (1993-09-01), Jewell et al.
patent: 5251225 (1993-10-01), Eglash et al.
patent: 5293392 (1994-03-01), Shieh et al.
patent: 5343487 (1994-08-01), Scott et al.
patent: 5358880 (1994-10-01), Lebby et al.
patent: 5365540 (1994-11-01), Yamanaka
patent: 5383211 (1995-01-01), Van de Walle et al.
patent: 5392307 (1995-02-01), Sugiyama et al.
patent: 5416044 (1995-05-01), Chino et al.
patent: 5422901 (1995-06-01), Lebby et al.
patent: 5468343 (1995-11-01), Kitano
patent: 5491710 (1996-02-01), Lo
patent: 5513204 (1996-04-01), Jayaraman
patent: 5568504 (1996-10-01), Kock et al.
patent: 5588995 (1996-12-01), Sheldon
patent: 5631472 (1997-05-01), Cunningham et al.
patent: 5693180 (1997-12-01), Furukawa et al.
patent: 5719891 (1998-02-01), Jewell
patent: 5719894 (1998-02-01), Jewell et al.
patent: 5719895 (1998-02-01), Jewell et al.
patent: 5729567 (1998-03-01), Nakagawa
patent: 5732103 (1998-03-01), Ramdani et al.
patent: 5747366 (1998-05-01), Brillouet et al.
patent: 5754578 (1998-05-01), Jayaraman
patent: 5757833 (1998-05-01), Arakawa et al.
patent: 5805624 (1998-09-01), Yang et al.
patent: 5809051 (1998-09-01), Oudar
patent: 5815524 (1998-09-01), Ramdani et al.
patent: 5818862 (1998-10-01), Salet
patent: 5825796 (1998-10-01), Jewell et al.
patent: 5835521 (1998-11-01), Ramdani et al.
patent: 5841152 (1998-11-01), Ishikawa
patent: 5877038 (1999-03-01), Coldren et al.
patent: 5883912 (1999-03-01), Ramdani et al.
patent: 5898722 (1999-04-01), Ramdani et al.
patent: 5903586 (1999-05-01), Ramdani et al.
patent: 5912913 (1999-06-01), Kondow et al.
patent: 5943357 (1999-08-01), Lebby et al.
patent: 5943359 (1999-08-01), Ramdani et al.
patent: 5956363 (1999-09-01), Lebby et al.
patent: 5960018 (1999-09-01), Jewell et al.
patent: 5974073 (1999-10-01), Canard et al.
patent: 5978398 (1999-11-01), Ramdani et al.
patent: 5985683 (1999-11-01), Jewell
patent: 5991326 (1999-11-01), Yuen et al.
patent: 6002705 (1999-12-01), Thornton
patent: 6021147 (2000-02-01), Jiang et al.
patent: 6046065 (2000-04-01), Goldstein et al.
patent: 6046096 (2000-04-01), Ouchi
patent: 6049556 (2000-04-01), Sato
patent: 6052398 (2000-04-01), Brillouet et al.
patent: 6057560 (2000-05-01), Uchida
patent: 6061380 (2000-05-01), Jiang et al.
patent: 6061381 (2000-05-01), Adams et al.
patent: 6121068 (2000-09-01), Ramdani et al.
patent: 6127200 (2000-10-01), Ohiso et al.
patent: 6148016 (2000-11-01), Hegblom et al.
patent: 6195485 (2001-02-01), Coldren et al.
patent: 6207973 (2001-03-01), Sato et al.
patent: 6252894 (2001-06-01), Sasanuma et al.
patent: 6252896 (2001-06-01), Tan et al.
patent: 6314118 (2001-11-01), Jayaraman et al.
patent: 6341137 (2002-01-01), Jayaraman et al.
patent: 6359920 (2002-03-01), Jewell et al.
patent: 6362069 (2002-03-01), Forrest et al.
patent: 6366597 (2002-04-01), Yuen et al.
patent: 6372533 (2002-04-01), Jayaraman et al.
patent: 6399966 (2002-06-01), Tsuda et al.
patent: 6424669 (2002-07-01), Jiang et al.
patent: 6434180 (2002-08-01), Cunningham
patent: 6465961 (2002-10-01), Cao
patent: 6542530 (2003-04-01), Shieh et al.
patent: 6567448 (2003-05-01), Sun et al.
patent: 6621842 (2003-09-01), Dapkus
patent: 6642070 (2003-11-01), Jiang et al.
patent: 6798809 (2004-09-01), Gambin et al.
patent: 2002/0067748 (2002-06-01), Coldren et al.
patent: 2002/0071464 (2002-06-01), Coldren et al.
patent: 2002/0071471 (2002-06-01), Kim et al.
patent: 2002/0075920 (2002-06-01), Spruytte et al.
patent: 2002/0075929 (2002-06-01), Cunningham
patent: 2002/0090016 (2002-07-01), Coldren et al.
patent: 2002/0131462 (2002-09-01), Line et al.
patent: 2003/0053510 (2003-03-01), Yuen et al.
patent: 2003/0179792 (2003-09-01), Riechert et al.
patent: 2006/0039432 (2006-02-01), Ha et al.
patent: 0 740 377 (1996-10-01), None
patent: 0 740 377 (1996-10-01), None
patent: 0 765 014 (1997-03-01), None
patent: 0 822 630 (1998-02-01), None
patent: 0 874 428 (1998-10-01), None
patent: 0 874 428 (1998-10-01), None
patent: 0 874 428 (1998-11-01), None
patent: 0 765 014 (1999-07-01), None
patent: 0 975 073 (2000-01-01), None
patent: 1182756 (2002-02-01), None
patent: 1 294 063 (2003-03-01), None
patent: 57026492 (1982-02-01), None
patent: 332930 (1997-06-01), None
patent: WO 98/07218 (1998-02-01), None
patent: 0896406 (1999-02-01), None
patent: WO 00/52789 (2000-02-01), None
patent: WO 00/52789 (2000-02-01), None
patent: WO 00/33433 (2000-06-01), None
patent: WO 00/33433 (2000-06-01), None
patent: WO 00/38287 (2000-06-01), None
patent: WO 00/65700 (2000-11-01), None
patent: WO 00/65700 (2000-11-01), None
patent: WO 01/16642 (2001-03-01), None
patent: WO 01/16642 (2001-03-01), None
patent: WO 01/17076 (2001-03-01), None
patent: WO 01/17076 (2001-03-01), None
patent: WO 01/18919 (2001-03-01), None
patent: WO 01/24328 (2001-04-01), None
patent: WO 01/24328 (2001-04-01), None
patent: WO 01/33677 (2001-05-01), None
patent: WO 01/33677 (2001-05-01), None
patent: WO 01/52373 (2001-07-01), None
patent: WO 0152373 (2001-07-01), None
patent: WO 01/84682 (2001-11-01), None
patent: WO 01/93387 (2001-12-01), None
patent: WO 01/93387 (2001-12-01), None
patent: WO 01/95444 (2001-12-01), None
patent: WO 01/98756 (2001-12-01), None
patent: WO 02/03515 (2002-01-01), None
patent: WO 02/17445 (2002-02-01), None
patent: WO 02/084829 (2002-10-01), None
Mayer and Lau, Electronic Material Science: For Integrated Circuits in Si and GaAs 1990, Macmillan Publishing company.
Electronics Material Science: For Integrated Circuits in Si and GaAs by James W. Mayer and S.S. Lau, Mcmillan Publishing Company.
Almuneau, G., et al., “Accurate control of SB composition in AlGaAsSb alloys on InP substrates by molecular beam epitaxy”, article, Journal of Crystal Growth, vol. 208, May 6, 1999, pp. 113-116.
Almuneau, G., et al., “Improved electrical and thermal properties of InP-AlGaAsSb Bragg mirrors for long-wavelength vertical-cavity lasers”, article, IEEE Photonics Technology Letters, Vo. 12, No. 10, Oct. 2000, pp. 1322-1324.
Almuneau, G., et al., “Molecular beam epitaxial growth of monolithic 1.55 μm vertical cavity surface emitting lasers with AlGaAsSb/AlAsSb Bragg mirrors”, article, Journal of Vacuum Science Technology, vol. 8, No. 3, May/Jun. 2000, pp. 1601-1604.
Black, K., et al. “Double-fused 1.5 μm vertical cavity lasers with record highToof 132K at room temperature”, article, Electronics Letters, vol. 34, No. 20, Oct. 01, 1998, pp. 1947-1949.
Blum, O., et al., “Electrical and optical characteristics of AlAsSb/BaAsSb distributed Bragg reflectors for surface emitting lasers”, article, Applied Physics Letters, vol. 67, No. 22, Nov. 27, 1995, pp. 3233-3235.
Blum, O., et al., “Highly reflective, long wavelength AlAsSb/GaAsSb distributed Bragg reflector grown by molecular beam epitaxy on InP substrates”, article, Applied Physics Letters, Vo. 66, No. 3, Jan. 16, 1995, pp. 329-331.
Boucart, J., e

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vertical cavity surface emitting laser including indium and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vertical cavity surface emitting laser including indium and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vertical cavity surface emitting laser including indium and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4006896

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.