Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2006-02-16
2010-10-19
Moore, Karla (Department: 1716)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C118S724000, C118S725000, C156S345310, C156S345320, C156S345330, C156S345370, C414S217000, C414S939000, C414S940000
Reexamination Certificate
active
07815739
ABSTRACT:
A semiconductor processing system includes a casing forming a handling area. The handling area includes a main-process area and a pre-process area divided from each other and connected through an openable port. The main-process area and the pre-process area are connected to their own lines for vacuum-exhausting gas therefrom and their own lines for supplying an inactive gas thereinto and adjust pressure independently. A transfer port unit is disposed on the casing to place a transfer container that stores target objects. The transfer port unit allows the transfer container to open to the main-process area while maintaining an airtightness of the main-process area. The system includes a vertical batch main-processing apparatus. The system also includes a vertical batch pre-processing apparatus connected to the pre-process area and that performs a pre-process on the target objects and transforms a semiconductor oxide film on the target objects into an intermediate film.
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Moore Karla
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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