Vertebral implant with dampening matrix adapted for...

Details Vertebral implant with dampening matrix adapted for... Vertebral implant with dampening matrix adapted for...

2006-05-30

2006-05-30

Robert, Eduardo O. (Department: 3733)

Prosthesis (i.e., artificial body members), parts thereof, or ai

Implantable prosthesis

Bone

Reexamination Certificate

active

07052515

ABSTRACT:
Disclosed is an endoprosthetic implant for a human spinal disc. The structure of the implant allows it to be inserted posteriorly. This insertion is accomplished by performing a partial discectomy in the affected region. An intervertebral space is then created by removing the fibrocartilage between the facing surfaces of adjacent vertebrae. The implant is then inserted into the intervertebral space. The implant is thus adapted to replace damaged or worn intervertebral discs. Furthermore, the structure of the implant, and its posterior insertion, alleviate most spinal pathologies.

REFERENCES:
patent: 4349921 (1982-09-01), Kuntz
patent: 5401269 (1995-03-01), Buttner-Janz et al.
patent: 5458642 (1995-10-01), Beer et al.
patent: 5824093 (1998-10-01), Ray et al.
patent: 6033429 (2000-03-01), Magovern
patent: 6227266 (2001-05-01), Moore et al.
patent: 6395032 (2002-05-01), Gauchet
patent: 6423065 (2002-07-01), Ferree
patent: 6533817 (2003-03-01), Norton et al.
patent: WO00/35386 (2000-06-01), None
U.S. Appl. No. 10/434/931, filed May 2003, Ferree.
Viscogliosi Bros., LLC, Artificial Discs: The Largest Growth Opportunity in Spine, Artificial Disc: Market Potential & Technology Update, 1999.

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