Versatile system for limiting mobile charge ingress in SOI...

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor – With peripheral feature due to separation of smaller...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21523

Reexamination Certificate

active

07148558

ABSTRACT:
Disclosed are apparatus and method for limiting mobile charge (314) ingress within a silicon-on-insulator (SOI) substrate (300). A mask (308) is applied to the substrate to form an aperture (210) over a desired portion of the substrate near its outer edge. A buffer material (214), selected to impede mobile charge ingress, is implanted (310) through the aperture into the insulator layer (304) of the substrate to form a buffer structure (312).

REFERENCES:
patent: 4381201 (1983-04-01), Sakurai
patent: 5314843 (1994-05-01), Yu et al.
patent: 6091086 (2000-07-01), Zommer
patent: 6379999 (2002-04-01), Tanabe
patent: 6492684 (2002-12-01), Bolam et al.
patent: 6593637 (2003-07-01), Ibok
patent: 6611045 (2003-08-01), Travis et al.
patent: 6958264 (2005-10-01), Lin
patent: 2001/0042862 (2001-11-01), Epke
patent: 2002/0063304 (2002-05-01), Toeda et al.
patent: 2002/0140030 (2002-10-01), Mandelman et al.
patent: 2002/0179902 (2002-12-01), Travis et al.
patent: 2003/0205730 (2003-11-01), Ohuchi
patent: 2004/0007739 (2004-01-01), Ohkubo

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Versatile system for limiting mobile charge ingress in SOI... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Versatile system for limiting mobile charge ingress in SOI..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Versatile system for limiting mobile charge ingress in SOI... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3714874

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.