Versatile system for charge dissipation in the formation of...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

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Details

C257SE23067, C257SE23145, C257SE21577, C257S296000

Reexamination Certificate

active

07119444

ABSTRACT:
The present invention provides a system for dissipating any aberrant charge that may accumulate during the fabrication of a semiconductor device segment (200), obviating overstress or break down damage to a focal device structure (208) that might result from uncontrolled dissipation of the aberrant charge. A substrate (202) has first and second intermediate structures (204, 206) disposed atop the substrate, with the focal structure disposed atop the substrate therebetween. A first conductive structure (210) is disposed atop the second intermediate structure, the focal structure, and a portion of the first intermediate structure. A third intermediate structure (214) is disposed contiguously atop the first conductive structure and the first intermediate layer. A void (216) is formed in a peripheral region (218) of device segment, through the first and third intermediate layers down to the substrate. A second conductive structure (220) is disposed atop the third intermediate structure such that it couples the substrate through the void.

REFERENCES:
patent: 5293059 (1994-03-01), Tamura
patent: 5536679 (1996-07-01), Park
patent: 6569729 (2003-05-01), Wu et al.
patent: 6917115 (2005-07-01), Teramoto
patent: 62-177945 (1987-08-01), None

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