Versatile semi-toroidal processing furnace with automatic...

Electric resistance heating devices – Heating devices – Radiant heater

Reexamination Certificate

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C392S418000, C219S390000, C219S388000, C219S405000, C219S411000, C118S724000, C118S725000, C118S050100, C414S217000, C165S133000, C432S121000

Reexamination Certificate

active

07068925

ABSTRACT:
The present invention comprises a fully automated, fabrication compliant furnace with the advantages of the horizontal and most of the advantages of the vertical furnace. One embodiment of the present invention is that it implements a multi-degree motion robot arm to move wafers from a loading area to a WIP station where the wafers are then loaded into wafer boats on a rotating cantilever system or directly onto a specialized and reconfigurable paddle designed to hold wafers. The wafers may be loaded in the horizontal processing position as well as the vertical processing position. Multiple levels of the semi-toroidal horizontal processors allow for multiple batches of wafers to be loaded, processed, cooled and unloaded by the robot arm.The present invention reduces the footprint of the traditional horizontal or vertical furnaces, increases capacity and throughput, and allows for direct tube transfer.

REFERENCES:
patent: 6281479 (2001-08-01), Guidotti et al.
patent: 6291801 (2001-09-01), Guidotti et al.
patent: 6672819 (2004-01-01), Soraoka et al.
Nerac Search, 1015237.048 Technical; Furnaces; CVD; Diffusion: Tubes; Wafer; Substrates, Peg Leahy, Feb. 12, 2002 (28 pages).

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