Chemistry of inorganic compounds – Halogen or compound thereof – Chlorine dioxide
Patent
1978-12-18
1980-06-03
Hearn, Brian E.
Chemistry of inorganic compounds
Halogen or compound thereof
Chlorine dioxide
423499, C01B 1102
Patent
active
042061938
ABSTRACT:
An improved process is provided for the production of chlorine dioxide and chlorine wherein a chlorine dioxide generator may be operated interchangeably in either sulfuric acid or hydrochloric acid mode without changing acidity levels or evacuating the liquor of one mode and refilling with liquor of the second mode before continuing generation. The versatile process for production of chlorine dioxide comprises maintaining saturated solutions of both alkali metal chloride and alkali metal sulfate in the generator at an acid normality of from about 2 to about 11 in the presence of a small amount of catalyst selected from the group consisting of vanadium pentoxide, silver ions, manganese ions, dichromate ions and arsenic ions. Thus, the instant process provides high yields of chlorine dioxide even at high acidities making it possible to manufacture balanced quantities of saltcake and alkali metal chloride by-products as may be required.
REFERENCES:
patent: 2936219 (1960-05-01), Rapson
patent: 3446584 (1969-05-01), Fuller
patent: 3733395 (1973-05-01), Fuller
patent: 3754081 (1973-08-01), Partridge
patent: 3933987 (1976-01-01), Schulz
patent: 4045542 (1977-08-01), Fuller
patent: 4049784 (1977-09-01), Fuller
patent: 4086328 (1978-04-01), Swindells
Lai Peter
Partridge Harold deV.
Casella Peter F.
Gosz William G.
Hearn Brian E.
Hooker Chemicals & Plastics Corp.
LandOfFree
Versatile process for generating chlorine dioxide does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Versatile process for generating chlorine dioxide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Versatile process for generating chlorine dioxide will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-715812