Venting system and initiator thereof

Ordnance – Shields – With explosive device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

11085720

ABSTRACT:
An initiator includes a reactive panel having a substrate and a plurality of reactive layers disposed on the substrate. The initiator further includes a transition manifold coupled with the reactive panel. A system for venting a container includes a venting device and an initiator coupled with the venting device. The initiator includes a reactive panel having a substrate, a plurality of reactive layers disposed on the substrate, and a transition manifold coupled with the reactive panel. A method of initiating a venting system includes providing a venting system operatively associated with the container, reacting a first material of the venting system with a second material of the venting system to produce an exothermic reaction, and venting the container as a result of reacting the first material with the second material.

REFERENCES:
patent: 3297503 (1967-01-01), Hoffmann et al.
patent: 5402728 (1995-04-01), Garner
patent: 5466537 (1995-11-01), Diede et al.
patent: 5538795 (1996-07-01), Barbee, Jr. et al.
patent: 5824941 (1998-10-01), Knapper
patent: 6619181 (2003-09-01), Frey et al.
patent: 2002/0182436 (2002-12-01), Weihs et al.
patent: 2004/0247930 (2004-12-01), Weihs et al.
Dictionary.com definition for the term “manifold” (7 pages) as obtained on Sep. 13, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Venting system and initiator thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Venting system and initiator thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Venting system and initiator thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3953003

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.