Venting of pellicle cavity for a mask

Details Venting of pellicle cavity for a mask Venting of pellicle cavity for a mask

2007-04-17

2007-04-17

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C355S075000, C428S014000

Reexamination Certificate

active

10334841

ABSTRACT:
The present invention describes a method of providing a substrate, the substrate being transparent to radiation at an actinic wavelength; forming an absorber layer over the substrate, the absorber layer including an active area and a peripheral area; removing the absorber layer from a portion of the peripheral area; and forming a trench in the substrate in the portion of the peripheral area.The present invention further describes a mask including an active area; and a peripheral area located around the active area, the peripheral area including vent channels.

REFERENCES:
patent: 4833051 (1989-05-01), Imamura
patent: 6103427 (2000-08-01), Storm
patent: 6558855 (2003-05-01), Tanaka et al.
patent: 6566021 (2003-05-01), Wang
patent: 6627365 (2003-09-01), Shiraishi
patent: 6841317 (2005-01-01), Wang
RW Murphy et al., “The Effect of Differentials on Pelliclized Photomasks”, Proceedings 14thAnnual Symposium on Photomask Techology and Management, SPIE vol. 2322, Sep. 14, 1994, Santa Clara, CA, pp. 187-201.

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