Ventilation system having true valve control for controlling ven

Surgery – Respiratory method or device – Means for supplying respiratory gas under positive pressure

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

12820425, 12820524, 137883, A61M 1600

Patent

active

046373861

ABSTRACT:
A ventilation system with positive and negative ventilation pressures controllable through a control unit is to be improved with respect to its adaptability, in particular in the generation of high pulse repetition frequencies above the natural breathing frequency. A gas transport element is provided in connection with a ring line which contains an inhalation valve in an inspiration branch and an exhalation valve in an expiration branch. The desired improvement is obtained by the fact that the gas transport element is arranged in the ring line with constant direction of delivery. By alternate control of the inhalation valve and exhalation valve in a closed system inspiration and expiration pulses are produced. In addition, a controllable valve unit is indicated in which the inhalation valve and the exhalation valve are actuated as diaphragm valves by combined injector and ejector units of low inertia.

REFERENCES:
patent: 2737178 (1956-03-01), Fox
patent: 3465752 (1969-09-01), Brychta et al.
patent: 3741208 (1973-06-01), Jonsson et al.
patent: 3916888 (1975-11-01), Buck et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ventilation system having true valve control for controlling ven does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ventilation system having true valve control for controlling ven, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ventilation system having true valve control for controlling ven will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2129812

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.