Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-01-11
2005-01-11
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
06841317
ABSTRACT:
The present invention provides an optical pellicle system which includes a frame having a top side and bottom side, a pellicle membrane configured to cover the top side of the frame, a photomask to which the bottom side of the frame is mounted, and at least one venting slot defined in the photomask, extending under the frame from an area defined within the frame to an area outside of the frame.
REFERENCES:
patent: 3927943 (1975-12-01), Pohl et al.
patent: 4032233 (1977-06-01), Oscarsson et al.
patent: 4159176 (1979-06-01), de Masi
patent: 4255216 (1981-03-01), Conant et al.
patent: 4470508 (1984-09-01), Yen
patent: 4833051 (1989-05-01), Imamura
patent: 5168993 (1992-12-01), Yen
patent: 5254375 (1993-10-01), Yen
patent: 5305878 (1994-04-01), Yen
patent: 5529819 (1996-06-01), Campi, Jr.
patent: 6103427 (2000-08-01), Storm
patent: 6190743 (2001-02-01), Wang
patent: 6436586 (2002-08-01), Matsuoka et al.
patent: 6524754 (2003-02-01), Eynon
patent: 56-70553 (1981-06-01), None
patent: 58-100852 (1983-06-01), None
patent: 59-125270 (1984-07-01), None
patent: 60-85383 (1985-05-01), None
SPI vol. 233 Photomask Technology and Management, Robert W. Murphy and Rick Boyd, “The Effect of Pressure Differentials on Pelliclized Photomasks,” pp. 187-201 (1994).
Kolisch & Hartwell, P.C.
Micro Lithography, Inc.
Rosasco S.
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