Varying feature size in resist across the chip without the...

Details Varying feature size in resist across the chip without the... Varying feature size in resist across the chip without the...

2005-03-22

2005-03-22

Lee, John R. (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C430S005000, C430S296000, C324S1540PB

Reexamination Certificate

active

06870168

ABSTRACT:
A method for creating a pattern on a substrate, the method includes the steps of imprinting a first pattern on the substrate; and imprinting a second substantially similar pattern which is mis-registered with regard to the first pattern so that the combination of the first and second patterns cause a systematic variation in a final size of defined elements across the substrate.

REFERENCES:
patent: 4538105 (1985-08-01), Ausschnitt
patent: 5103101 (1992-04-01), Berglund et al.
patent: 5773836 (1998-06-01), Hartley
patent: 5905020 (1999-05-01), Hu et al.
patent: 6278123 (2001-08-01), Hu et al.
patent: 6331711 (2001-12-01), Vernon
patent: 6335151 (2002-01-01), Ausschnitt et al.
patent: 20020045105 (2002-04-01), Brown et al.

Affiliated with

Also associated with

Rating

Varying feature size in resist across the chip without the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Varying feature size in resist across the chip without the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Varying feature size in resist across the chip without the... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3457548