Variably shaped beam EB writing system

Details Variably shaped beam EB writing system Variably shaped beam EB writing system

2006-05-09

2006-05-09

Wells, Nikita (Department: 2883)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

07041991

ABSTRACT:
A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position described to a pattern data. The adjustment module adjusts at least one of a second length unit to specify a pattern length which is drawn by the variably shaped beam EB writing system and a second position unit to specify a position thereof to a value of which at least one of the first length unit and the first position unit are divided by a natural number. The drawing module draws a predetermined pattern based on at least one of the second length unit and the second position unit adjusted by the adjustment module.

REFERENCES:
patent: 5210696 (1993-05-01), Yano
patent: 5305225 (1994-04-01), Yamaguchi et al.
patent: 2002/0036273 (2002-03-01), Okino
R. Yoshikawa, et al., “A High Dose and High Accuracy Variable Shaped Electron Beam Exposure System for Quartermicron Device Fabrication,” J. Vac. Sci. Technol., B5(1), Jan/Feb 1987, pp. 70-74.

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