Variable thickness self-aligned photoresist process

Details Variable thickness self-aligned photoresist process Variable thickness self-aligned photoresist process

1979-09-13

1980-11-04

Ozaki, G.

Metal treatment

Compositions

Heat treating

148187, 29578, 250492A, H01L 2126

Patent

active

042318114

ABSTRACT:
A process for forming with a single masking step regions of different thicknesses in a photo-sensitive layer is disclosed. A masking member or reticle includes opaque and transparent areas and areas with a grating. The pitch of the periodic grating is of a lesser dimension than can be resolved by the masking projection apparatus. The photo-sensitive region illuminated by the grating receives uniform illumination at an intermediate intensity, thereby providing, after developing, a layer with regions of intermediate thickness.

REFERENCES:
patent: 3920483 (1975-11-01), Johnson
patent: 3997367 (1976-12-01), Yau
patent: 4035226 (1977-07-01), Farber et al.
patent: 4137458 (1979-01-01), King et al.
patent: 4140913 (1979-02-01), Anger et al.
patent: 4144101 (1979-03-01), Rideout
patent: 4149904 (1979-04-01), Jones
patent: 4163155 (1979-07-01), Alles et al.
patent: 4182023 (1980-01-01), Cohen et al.

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