Variable-spot scanning in an electron beam exposure system

Details Variable-spot scanning in an electron beam exposure system Variable-spot scanning in an electron beam exposure system

1978-02-21

1979-09-11

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, 250492B, A61K 2702

Patent

active

041676769

ABSTRACT:
An attractive high-throughput technique for writing microcircuit patterns with a scanning electron spot of variable size is described in application Ser. No. 855,608, filed Nov. 29, 1977. In such an electron beam exposure system, two spaced-apart apertured mask plates with a deflector therebetween are included in the electron column of the system. As described herein, a third apertured mask plate and an associated deflector are serially added to the aforenoted components in the column. In this way, the throughput and other performance characteristics of such a system are significantly enhanced.

REFERENCES:
patent: 2802110 (1957-08-01), Kazato et al.
patent: 3875416 (1975-04-01), Spicer et al.
patent: 3876883 (1975-04-01), Broers

Affiliated with

Also associated with

Rating

Variable-spot scanning in an electron beam exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Variable-spot scanning in an electron beam exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Variable-spot scanning in an electron beam exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-479048