Variable rectangle-type electron beam exposure apparatus and...

Details Variable rectangle-type electron beam exposure apparatus and... Variable rectangle-type electron beam exposure apparatus and...

2007-04-17

2007-04-17

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

11319205

ABSTRACT:
A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles which is capable of highly finely conducting exposure with respect to a predetermined fine line pattern having an arbitrary angle in the pattern region. The apparatus includes a first slit member (10) in which a plurality of rectangular apertures (11, 12) are respectively arranged by different angles; a second slit member (20) in which a plurality of rectangular apertures (21, 22) which are respectively positioned in parallel with the corresponding rectangular apertures of the first slit member, are arranged; and a deflecting unit (40) for deflecting an electron beam, which has been transmitted through a plurality of apertures of the first slit member, so that, when the electron beam transmitted through the first aperture of the first slit member is transmitted through the corresponding first aperture of the second slit member, the electron beam transmitted through the apertures except for the first aperture of the first slit can be intercepted by the second slit member.

REFERENCES:
patent: 4914304 (1990-04-01), Koyama
patent: 6288407 (2001-09-01), Itoh
patent: 09-082630 (1997-03-01), None

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