Variable gas volume flow measuring and control methods and appar

Fluid handling – Processes – With control of flow by a condition or characteristic of a...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

137487, 1374875, 13762411, 73262, 364510, G05D 700

Patent

active

047966513

ABSTRACT:
A method and apparatus for measuring gas flow volume in a system (of the kind in which the amount of gas flowing in a duct can vary in response to the variation of area of a variable area orifice in a duct and/or in response to changes in the total pressure of the gas upstream of the orifice) references the total pressure upstream of the orifice to the static pressure downstream of the orifice to produce a first signal representative of the differential pressure between the total pressure upstream of the orifice and the static pressure downstream of the orifice. The method and apparatus produce a second signal corresponding to the area of the opening in the orifice. The first and second signals are supplied to a gas flow volume database which is correlated to the sensors and to the orifice in the duct. The gas flow volume occurring in the duct at the first and second signals is read out from the database.

REFERENCES:
patent: 3719321 (1973-03-01), McNabney
patent: 4026321 (1977-05-01), Kahoe
patent: 4277832 (1981-07-01), Wong
patent: 4414950 (1983-11-01), Otsuka
patent: 4581707 (1986-04-01), Millar

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Variable gas volume flow measuring and control methods and appar does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Variable gas volume flow measuring and control methods and appar, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Variable gas volume flow measuring and control methods and appar will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2103149

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.