Variable displacement vane pump and method of manufacturing...

Rotary expansible chamber devices – With changeable working chamber magnitude – Cylinder or cylinder portion moved linearly and radially

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C418S030000, C417S220000, C029S888025

Reexamination Certificate

active

07832995

ABSTRACT:
A variable displacement vane pump includes a first body, a second body, an adapter ring, a cam ring, and a rotor. The first body includes a cylinder portion, and a base portion covering a first longitudinal end of an inner space of the cylinder portion. The second body covers a second longitudinal end of the inner space of the first body. The adapter ring has an outer radial periphery fitted and fixed to an inner radial periphery of the cylinder portion of the first body. The cam ring is mounted inside the adapter ring and supported by the adapter ring for lateral motion in contact with the contact area of the adapter ring. The rotor is mounted inside the cam ring. The adapter ring has a radial thickness that gradually increases when followed longitudinally of the adapter ring from the base portion of the first body toward the second body.

REFERENCES:
patent: 6382925 (2002-05-01), Oba et al.
patent: 6976830 (2005-12-01), Uchino
patent: 7128542 (2006-10-01), Suzuki et al.
patent: 7-119648 (1995-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Variable displacement vane pump and method of manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Variable displacement vane pump and method of manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Variable displacement vane pump and method of manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4228632

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.