Variable density fill shape generation

Details Variable density fill shape generation Variable density fill shape generation

1996-12-20

1999-07-13

Teska, Kevin J.

Boots, shoes, and leggings

364489, 364490, 364491, 364578, G06F 1750

Patent

active

059235632

ABSTRACT:
The present invention is directed to a method for adding fill shapes to a chip in a manner which accommodates a wide range of within-chip pattern density variations and provides a tight pattern density control (i) within a chip and (ii) from chip to chip. The present invention imposes a grid over a chip design pattern, wherein each section of the grid contains a portion of the chip design. A pattern density is then determined for each section of the grid, based on that portion of the chip design pattern which lies within the particular grid section. The results of the pattern density determination are used to determine where to place fill shapes in the chip design in order to increase a density value in each section of the grid to that of a target density value. The method and apparatus of the present invention provide a best fit approximation to the desired pattern density consistent with a set of layout rules for the level being patterned.

REFERENCES:
patent: 5278105 (1994-01-01), Eden et al.
patent: 5341310 (1994-08-01), Gould et al.
patent: 5552996 (1996-09-01), Hoffman et al.
patent: 5636133 (1997-06-01), Chesebro et al.

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