Variable annular illuminator for photolithographic projection im

Photocopying – Projection printing and copying cameras – Illumination systems or details

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Details

362268, 362282, G03B 2754

Patent

active

057574707

ABSTRACT:
The illumination of a photolithographic projection imager is given a variable annular intensity profile by using diverging and counter diverging elements that are movable relative to each other in the illumination path. An upstream element diverges the illumination into an annular configuration, the radius of which is set by the distance downstream to the counter diverging element. Convex and concave conical surfaces on the movable elements can accomplish this.

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"0.25 .mu.m Lithography Using a Deep-UV Stepper with Annular Illumination" by A. Yen, W.N. Partlo, R.W. McCleary, and M.C. Tipton, Presented at Microcircuit Engineering 92, Erlangen, Germany, in Jun. '92, for Publication in Proceedings of Same.
"Polarization Effects of Axicons" by David Fink, in Applied Optics, Mar. 1979, pp. 581-582 (vol. 18, No. 5).
"Mirror System for Uniform Beam Transformation in High-Power Annular Lasers" by J.W. Ogland, in Applied Optics, Sep. 1978, vol. 17, No. 18, pp. 2917-2923.

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