Variable angle illumination wafer inspection system

Details Variable angle illumination wafer inspection system Variable angle illumination wafer inspection system

2005-02-08

2005-02-08

Pham, Hoa Q. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Reexamination Certificate

active

06853446

ABSTRACT:
A variable illumination angle inspection system is provided, including a light source providing a light beam and a scanner imparting scanning deflection to the light beam to provide a scanning beam approaching a substrate at a first angle. A deflection element is selectively insertable into an optical path of the scanning beam to deflect the scanning beam so as to cause the scanning beam to approach the substrate at a second angle.

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PCT Notification of Transmittal of the International Search Report or the Declaration dated Dec. 12, 200.

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