Vapour generator for chemical vapour deposition systems

Details Vapour generator for chemical vapour deposition systems Vapour generator for chemical vapour deposition systems

1993-10-18

1995-01-10

Chaudhuri, Olik

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

222630, 261 16, C23C 1600

Patent

active

053803671

ABSTRACT:
The vapour generator for chemical vapour deposition plants allows the extraction of metalorganic vapours from liquid or solid sources. It mainly consists of a container into which a gas flows in, and as it passes near the reagent, it is saturated with the vapours produced and transports them to the reaction chamber. Only the generator is brought to a temperature which is higher than room temperature so as to obtain a vapour which is saturated with a high quantity of reagent. To avoid vapour condensation in the pipe system transporting it from the generator to the reaction chamber, it is diluted with a carrier gas directly in the body of the heated generator, reducing in this way the condensation temperature of vapour which becomes unsaturated. For this purpose, the generator contains a dilution bypass-line in the upper base into which the carrier gas is made to flow. The pipe system going from the generator to the reaction chamber can be held at room temperature without any condensation risks.

REFERENCES:
patent: 4506815 (1985-03-01), Melas et al.
patent: 4545801 (1985-10-01), Miyajiri et al.
patent: 4783343 (1988-11-01), Sato
patent: 4919304 (1990-04-01), Markowicz
patent: 5069244 (1991-12-01), Miyazaki et al.
patent: 5151395 (1992-09-01), Tom
patent: 5199603 (1993-04-01), Prescott

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