Vaporizing material at a uniform rate

Coating processes – Coating by vapor – gas – or smoke

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07989021

ABSTRACT:
A method of vaporizing material at a uniform rate for forming a layer on a substrate includes feeding a column of vaporizable material from a temperature controlled region maintained below the vaporizable material's effective vaporization temperature to a source of vaporization energy, wherein the volume of the column can vary during vaporization; and providing a source of vaporization energy delivering a constant heat flux to the surface of the column so that a uniform volume per unit time of the vaporizable material is vaporized to form the layer on the substrate, irrespective of the feeding rate.

REFERENCES:
patent: 2447789 (1948-08-01), Barr
patent: 6296711 (2001-10-01), Loan et al.
patent: 2003/0008071 (2003-01-01), Van Slyke et al.
patent: 2004/0062856 (2004-04-01), Marcus et al.
patent: 2005/0072361 (2005-04-01), Yang et al.
patent: 2006/0062915 (2006-03-01), Long et al.
patent: 2006/0099344 (2006-05-01), Boroson et al.
patent: 2006/0099345 (2006-05-01), Grace et al.
patent: 0585848 (1994-03-01), None
patent: 0982411 (2000-03-01), None
patent: 2003-293121 (2003-10-01), None
patent: WO 2006/034028 (2006-03-01), None
patent: WO 2006/052467 (2006-05-01), None
patent: WO 2006/053017 (2006-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vaporizing material at a uniform rate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vaporizing material at a uniform rate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vaporizing material at a uniform rate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2755164

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.