Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Reexamination Certificate
2004-05-11
2010-02-23
Cleveland, Michael (Department: 1792)
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
Reexamination Certificate
active
07666260
ABSTRACT:
A vaporizer includes a vaporizing chamber configured to vaporize a liquid material and thereby form a gas material. A spray portion is configured to spray the liquid material in the vaporizing chamber. A delivery part is configured to deliver the gas material from the vaporizing chamber to a gas outlet. A heating portion is configured to heat the vaporizer. The delivery part includes a filter member covering the gas outlet and configured to allow the gas material to pass therethrough. A shield plate is disposed to cover the filter member on a side farther from the gas outlet.
REFERENCES:
patent: 3888649 (1975-06-01), Simhan
patent: 4550706 (1985-11-01), Hoffman
patent: 5032461 (1991-07-01), Shaw et al.
patent: 5683606 (1997-11-01), Ushikoshi et al.
patent: 6074487 (2000-06-01), Yoshioka et al.
patent: 6144802 (2000-11-01), Kim
patent: 6207239 (2001-03-01), Affinito
patent: 6210485 (2001-04-01), Zhao et al.
patent: 6409839 (2002-06-01), Sun et al.
patent: 6454860 (2002-09-01), Metzner et al.
patent: 2003/0033978 (2003-02-01), Zhao et al.
patent: 2004/0000379 (2004-01-01), Slyke et al.
patent: 6-310444 (1994-11-01), None
patent: 7-94426 (1995-04-01), None
patent: 7-310185 (1995-11-01), None
patent: 8-131812 (1996-05-01), None
patent: 2000-119858 (2000-04-01), None
patent: 2001-274145 (2001-10-01), None
patent: 2004-211183 (2004-07-01), None
Chen Keath T
Cleveland Michael
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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