Vaporizer and processor

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Details

C118S726000, C156S345330

Reexamination Certificate

active

07827932

ABSTRACT:
A vaporizer vaporizes a force-fed liquid source material in a depressurized atmosphere to generate a source gas and discharging the source gas together with a carrier gas. The vaporizer includes a liquid reservoir chamber for temporarily storing the force-fed liquid source material; and a vaporization chamber communicating with the liquid reservoir chamber via a valve port. Further, the vaporizer includes a valve body adapted to sit on a valve seat surrounding the valve port of the liquid reservoir chamber; an actuator for driving the valve body; a carrier gas injection hole formed at a side of the valve body facing the valve port; and a discharge port for discharging the source gas from the vaporization chamber. By virtue of a specific arrangement of the carrier gas injection hole, the liquid source material is prevented from remaining unvaporized at a downstream side of the valve port.

REFERENCES:
patent: 2896658 (1959-07-01), Jones
patent: 6224681 (2001-05-01), Sivaramakrishnan et al.
patent: 7332040 (2008-02-01), Kojima et al.
patent: 2002/0017246 (2002-02-01), Kojima et al.
patent: 2000204472 (2000-07-01), None
patent: 2001148347 (2001-05-01), None
patent: 2001262350 (2001-09-01), None
patent: 2002217181 (2002-08-01), None
patent: 2003-347289 (2003-12-01), None
patent: WO 2005112081 (2005-11-01), None

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