Gas and liquid contact apparatus – With external supply or removal of heat – Heat producer
Reexamination Certificate
2006-05-02
2006-05-02
Bushey, Scott (Department: 1724)
Gas and liquid contact apparatus
With external supply or removal of heat
Heat producer
C261S078200, C261SDIG065, C118S726000
Reexamination Certificate
active
07036801
ABSTRACT:
The present invention provides a vaporizer having a vaporization chamber for a CVD material, a CVD material feed portion supplying the CVD material for the vaporization chamber, a vaporized gas exhaust port and a heater for heating the vaporization chamber, wherein the CVD material feed portion has passageways for the CVD material and for a carrier gas respectively and the passageway for the CVD material has a pressure loss inducer for the CVD material. At the same time, the present invention provides an apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing the CVD material that supplies the vaporized gas for a semiconductor production apparatus having a pressure loss-inducer for the CVD material between the liquid flow controller and the vaporizer. According to the present invention, even in the case of vaporizing and supplying with a decrease in a feed amount of a carrier gas to be supplied accompanying the CVD material employing a solid CVD material, reducing and stabilizing both the pressure fluctuation in the vaporizer and the flow rate fluctuation in the liquid flow controller and efficiently vaporizing a CVD material at a desirable concentration and flow rate without causing deposit or adhesion of the solid material in the vaporization chamber can be achieved.
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Asano Akira
Iwata Mitsuhiro
Kiriyama Koji
Takamatsu Yukichi
Tonari Kazuaki
Bushey Scott
Japan Pionics Co., Ltd.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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