Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1988-08-09
1992-04-21
Bennet, Henry A.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34 73, 134 11, F26B 700
Patent
active
051055562
ABSTRACT:
Vapor is separated from mist accompanying the vapor by passing the vapor through a porous membrane. The vapor having passed through the membrane is brought into contact with an object to be washed and condenses thereon, whereby the object is washed.
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Moreau et al, Wafer Cleaner System, IBM Technical Disclosure Bulletin vol. 14, No. 10, Mar. 1972.
"Ultra-Pure Water High Purity Chemical Substance Supply System Proceeding" Second Symposium on Ultra LSI Ultra-Clean Technology Symposium No.2, pp. 399-419.
Ebara Katsuya
Hishinuma Yukio
kouchi Isao
Kurokawa Hideaki
Matsuzaki Harumi
Bennet Henry A.
Hitachi , Ltd.
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