Measuring and testing – Gas analysis – Gas chromatography
Patent
1974-03-27
1976-04-20
Gill, James J.
Measuring and testing
Gas analysis
Gas chromatography
23254R, 338 34, G01N 2704, G01N 3106
Patent
active
039509800
ABSTRACT:
A device for measuring the presence or time-average amounts of at least one selected gas in a mixture thereof which comprises an enclosure having therewithin at least one substance which interacts with the gas to be monitored. Attenuating means associated with the enclosure regulate gas movement within said enclosure to insure that an essentially placid layer of gas exists between the attenuating means and the reactive substance insuring that the amount of selected gas available to react with the interactive substance is basically a function of the concentration of the gas or gases being measured and its diffusion through the placid layer. The amount of selected gas measured is substantially independent of the velocity and impinging angle of the gas mixture at the interface of the enclosure with the ambient gas mixture. The device is capable of controlling mass uptake and response time without losing velocity and angle independence. The control of mass uptake can be accomplished independent of the concentration of detectable gas.
REFERENCES:
patent: 2976188 (1961-03-01), Kohl
patent: 3478574 (1969-11-01), Modell
patent: 3481179 (1969-12-01), Howarth
patent: 3558764 (1971-01-01), Isaccson et al.
patent: 3578409 (1971-05-01), Silverman
patent: 3703696 (1972-11-01), Browall et al.
patent: 3714562 (1973-01-01), McNerney
patent: 3755800 (1973-08-01), Purt et al.
patent: 3764269 (1973-10-01), Oldham et al.
patent: 3771960 (1973-11-01), Kim et al.
Braun David L.
Trine John A.
Gill James J.
Kreitman Stephen A.
Minnesota Mining and Manufacturing Company
LandOfFree
Vapor sampling device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vapor sampling device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor sampling device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1577958